Research And Development

PhotoStress®

PhotoStress Method

The PhotoStress® analysis is composed of a reflection polariscope and PSCalc®

computer software that enables the user to store and process LF/Z-2 readings

of stress and strain.


A variety of photoelastic coatings may be applied on a wide range of materials,

with simple or complex shapes.

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PhotoStress Method

The coating displays the strains (or stresses) in a colourful and informative

pattern, which immediately reveals the overall stress distribution and pinpoints

highly stressed areas.

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PhotoStress Coating and Contouring Process

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Result And Analysis of PhotoStress

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Preparation of residual stress measurement


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Drilling in progress

to measure relief residual strains

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Computed residual stress results

on the wet welding specimen

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